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旋转阴极
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IM (旋转磁棒,靶材静止)
高性能磁棒
高性能免维护磁棒
RAM-Bar™
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e-Cathode™ 整体智能阴极
envis-ION™ 预处理源
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选择产品
旋转阴极
嵌入式端头
外置式端头
摆动阴极 (旋转磁棒, 旋转靶材)
IM (旋转磁棒,靶材静止)
高性能磁棒
高性能免维护磁棒
RAM-Bar™
ARM-Bar™
e-Cathode™ 整体智能阴极
envis-ION™ 预处理源
溅射相关配件
应用行业
获得支持
配件,服务和培训资料
资料列表
疑问解答
摇摆阴极控制软件
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溅射组件
招贤纳士
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靶材尺寸图纸
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有害物质(ROHS)认证
其他资料
ARM-Bar™ datasheet
CC80 end block datasheet
CM end block datasheet
cMC end block datasheet
e-Cathode™ process lid datasheet
envis-ION™ DMPTS datasheet
Gas manifold datasheet
IM_Data_Sheet
LidRetrofit_Data_Sheet
Magnet_Bar_Cradle_Data_Sheet
Magnetics for 125 mm ID diameter targets datasheet
Magnetics for 80 mm ID diameter targets datasheet
MC end block datasheet
MC Swing™ datasheet
MM end block datasheet
RAM-Bar™ 2.0
RAM-Bar™ Changing Station datasheet
RAM-Bar™ magnetics datasheet
SC end block datasheet
SM end block datasheet
Swing Cathode™ (external mount) datasheet
Swing-DUO™ software datasheet
TC end block datasheet
Why choose a rotary cathode system?
80 mm ID Mandrel - Inch
80 mm ID Mandrel - Metric
QRM Optimized Target - Horizontal Target Change
QRM Target with Retainer - Vertical Target Change
80 mm ID Target - Inch
SCI Metric Mandrel For Cantilever - Standard
SCI Metric Mandrel with Retainer - Vertical Target Change
SCI Metric Target - Standard
SCI Metric Target - Imperial Dimensions
SCI Metric Target with Retainer - Vertical Target Change
SCI Metric Target For Cantilever - Imperial Dimensions
SCI Tapered Target - Generic
QRM Target for Cantilever
SCI Metric Mandrel - Standard
80 mm ID Target - Metric
Suggested VFD parameter settings for Bodine motors
Typical DDR values
Ionization cloud formation in rotary cathode plasma confinement
Exploration into sputtered ITO film properties as a function of magnetic field strength
Remotely adjustable magnet bar battery lifetime calculations
Pretreatment of polymer substrates using the envis-ION™ DMPTS
Rotary Cathode Vacuum Leak Performance
Rotary cathode sputtering target design considerations
Practical limitations for the bi-polar pulse sputtering of Al2O3 with rotary magnetron targets….
Target fixation types and solutions
Rotary cathodes basics – Sputtering target materials and process
The economics of rotary cathodes
Sputtering onto large area static substrates using the Swing Cathode™
Uniformity optimization for static substrates using the Swing DUO™ software
AC induction motors and VFD settings
MM-Series End Block and Magnet Assembly RoHS Certification
RAM-Bar™ Series Magnet Bar RoHS Certification
MCD-Series End Block and Magnet Assembly RoHS Certification
SC-Series End Block and Magnet Assembly RoHS Certification
TC-Series End Block and Magnet Assembly RoHS Certification
SM-Swing Series End Block and Magnet Assembly RoHS Certification
ARM-Bar™ RoHS Certification
MM Swing™ and QRM Magnet Assembly RoHS Certification
CM-Series End Block and Magnet Assembly RoHS Certification
SCI_General_Terms_and_Conditions_of_Sale
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